Therma-Wave Wins Multi-Million Dollar Order for Metrology Solutions to

Therma-Wave Wins Multi-Million Dollar Order for Metrology Solutions to Support In-Process DRAM Manufacturing

    Business Editors/High-Tech Writers

    FREMONT, Calif.--(BUSINESS WIRE)--March 16, 2005--

Taiwanese Memory Maker to Use Therma-Wave Optical CD Tools in 300mm Fab
    Therma-Wave, Inc. (Nasdaq:TWAV), a worldwide leader in the development, manufacture and sale of process control metrology systems used in the manufacture of semiconductors, today announced that a leading Taiwanese DRAM (Dynamic RAM) semiconductor manufacturer has selected multiple Therma-Wave metrology solutions for use in its 300-mm factory. The multi-million dollar order includes multiple Opti-Probe 7341 thin film metrology tools with real-time, critical-dimension (RT/CD) capability for use in 90nm technology node production, extendible to 65nm development work. The order also includes a Therma-Probe 630XP tool for ion implant metrology.
    Therma-Wave Opti-Probe tools will be used for thickness and CD measurements in both front and back-end metrology applications throughout the customer's fab. Opti-Probe will be used to measure thin films applied by Chemical Vapor Deposition (CVD) and removed by plasma etching. In addition, Therma-Wave's RT/CD capability will be evaluated for chemical mechanical planarization (CMP) process control. The Opti-Probe with RT/CD can provide simultaneous thickness and erosion measurements, in near real-time, making it an ideal choice for monitoring and controlling CMP production process results.
    "Therma-Wave continues to deliver a range of solutions, based on advanced metrology tools, that meet the diverse and changing needs of our customers," commented Boris Lipkin, president and chief executive officer of Therma-Wave. "The need to monitor critical dimensions in real-time throughout the semiconductor manufacturing process and control the CMP process and its three-dimensional effects on device features is accelerating. Using the Therma-Wave Opti-Probe RT/CD, this customer will be able to ensure that its metrology capabilities continue to meet the challenges associated with fabricating DRAMs with sub-90 nm processes."
    Therma-Wave's Opti-Probe RT/CD combines the metrology strengths of high information-content scatterometry and spectroscopic ellipsometry. The tool delivers linewidth, feature profile and thin film thickness data via real-time regression algorithms that calculate and display results without off-line modeling and solution libraries.
    The addition of the Therma-Probe XP ion implantation metrology tool adds to this customer's ability to monitor and control ion implant dose with repeatable measurement capability for the 90-nm technology node and beyond. The Therma-Probe series of tools has become an industry standard in providing non-destructive, simultaneous determination of implanted dose and depth.

    About Therma-Wave, Inc.

    Since 1982, Therma-Wave, Inc., has been revolutionizing process control metrology systems through innovative proprietary products and technologies. The company is a worldwide leader in the development, manufacture, marketing and service of process control metrology systems used in the manufacture of semiconductors. Therma-Wave currently offers leading-edge products to the semiconductor manufacturing industry for the measurement of transparent and semi-transparent thin films; for the measurement of critical dimensions and profile of IC features; for the monitoring of ion implantation; and for the integration of metrology into semiconductor processing systems. For further information about Therma-Wave, Inc., access the web site at: www.thermawave.com.

    Safe Harbor Statement

    This press release contains forward-looking statements as that term is defined in the Private Securities Reform Act of 1995, which are subject to known and unknown risks and uncertainties that could cause actual results to differ materially from those expressed or implied by such statements. Such statements as those relating to the expected results of our Opti-Probe RT/CD product delivering a range of solutions that meet the diverse and changing needs of our customers; the need to monitor critical dimensions in real-time throughout the semiconductor manufacturing process and control the CMP process and its three-dimensional effects on device features accelerating; and continuing to ensure that our metrology capabilities meet the challenges associated with fabricating DRAMs with sub-90 nm processes are based on current expectations. Such statements are subject to risks, uncertainties and changes in condition, particularly those related to industry performance and other risks, some of which are detailed in documents filed with the Securities and Exchange Commission including specifically Exhibit 99.1 to the Company's annual report on Form 10-K for the year ended March 31, 2004 and subsequent Forms 10-Q and S-3 filings. The Company undertakes no obligation to update the information in this press release.

    Note: Therma-Probe, Opti-Probe and RT/CD are registered trademarks of Therma-Wave, Inc.

--30--JR/sf*

CONTACT: Therma-Wave, Inc. Ray Christie, 510-668-2200 rchristie@thermawave.com

KEYWORD: CALIFORNIA TAIWAN INTERNATIONAL ASIA PACIFIC INDUSTRY KEYWORD: HARDWARE SOFTWARE MANUFACTURING PRODUCT EDA SOURCE: Therma-Wave, Inc.

Copyright Business Wire 2005